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Dr. Giorgos Gakis is a chemical engineer, graduated from the National Technical University of Athens (NTUA), Greece, in 2015. For his diploma thesis, he was awarded the best diploma thesis award of the year 2015 in the Department of Process Analysis and Plant Design of NTUA.
He then obtained his PhD in 2019, from NTUA and Institut National Polytechnique de Toulouse (INPT), France, entitled “Multi-scale modelling and experimental analysis of ALD alumina: Interplay of process dynamics, chemistry and interfacial phenomena”. The PhD was funded through a NTUA Research Committee Scholarship and the Toulouse Tech Inter Lab 2016 grant. For his PhD thesis, he was awarded the Léopold Escande Award for the best doctoral theses of INPT for the year 2019.
His main research work is focused on the combined experimental and computational analysis of thin film manufacturing processes, such as Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) processes. His research interests also include nanomaterial risk assessment, and specifically the bio-distribution and toxicity modelling of nanoparticles.